DKK Colleague Wins at the CerSJ Awards for Achievements in Industrial Ceramic Technology
The Ceramic Society of Japan (“CerSJ”) Awards is presented to individuals in recognition of their contributions to the progress and growth of the ceramics industry, science, and technology, and their exceptional record in academic research and technology as well as distinguished service to the Society and the industry. Mr. Masayuki TAKAI of DKK was recognized by this prestigious organization.
DURAZR🄬-S
The award-winning technology is our zirconia ceramic material “DURAZR🄬-S” newly developed by DKK. In-house comparisons of sintered compacts using this new material have approximately three times the toughness of earlier ones. They also show hydrothermal deterioration resistance even in hot water environments while keeping the same strength as conventional products. The award was decided at the end of last year, and the award ceremony will be held this spring.
About DKK
DKK America Materials, Inc. (“DKA”) is the wholly-owned U.S. subsidiary of Daiichi Kigenso Kagaku Kogyo Co., Ltd. (“DKK”). DKK America Materials, Inc. (“DKA”) maximizes the potential of zirconium compounds.
As a dedicated zirconium manufacturer, our unique technologies maximize the potential of zirconium properties. Our zirconium compounds and materials have many applications that advance technology and safety.
Applications Include:
- Industrial Catalysts
- Dental Materials
- Automotive Catalysts
- Electronic Materials
- Fine Ceramics
- Fuel Cells
- Oxygen Sensors
- Semiconductors
July Product Highlights
Semi-conductors
DKK America Materials, Inc. (“DKA”) produces zirconium compounds that contribute to making semiconductors.
Zirconium plays a crucial role when making semiconductors. Why is it so special? Zirconium dioxide boasts an incredible power – a high dielectric constant (k) and excellent thermal stability. Translation? It can store more charge per unit area, resulting in faster and more efficient transistors.
Furthermore, zirconium nitride (ZrN) prevents metal mayhem by stopping unwanted metal diffusion between different layers. It’s got serious adhesion skills, making sure everything sticks together. Zirconium helps make our gadgets smarter, faster, and cooler!
CMP Slurries
DKK America Materials, Inc. (“DKA”) produces zirconium compounds that contribute to making Chemical Mechanical Planarization (CMP) slurries.
Check out these interesting tidbits about CMP slurries:
- CMP slurries are specially designed mixtures used in the semiconductor industry to achieve super-smooth surfaces on silicon wafers. What is a silicon wafer you might ask? It’s a material used for producing semiconductors, which can be found in all types of electronic devices.
- CMP slurries consist of abrasive particles, a chemical component, and a carrier fluid.
- The abrasive particles in CMP slurries are typically made of materials like aluminum oxide or silica. These tiny particles help remove excess material from the wafer surface, creating a polished finish.
The chemical component in CMP slurries acts as a reactive agent, assisting in the removal of specific materials. It enhances the polishing process by chemically reacting with the surface, making it easier to achieve precise results.
CMP slurries play a crucial role in manufacturing advanced microchips and integrated circuits. They help create the intricate circuitry patterns and tiny structures that power our smartphones, computers, and other high-tech devices.
So next time you’re amazed by the incredible technology in your pocket, remember that CMP slurries played a significant part in making it all possible!
CMP Polishing
DKA produces zirconium compounds that help make Chemical Mechanical Planarization (CMP) polishing possible.
CMP polishing is a cutting-edge technique used in the manufacturing of semiconductors, ensuring the highest quality and performance. It involves a combination of chemical and mechanical forces to achieve an ultra-smooth and flat surface on silicon wafers.
Zirconium plays a crucial role in its development. With its exceptional hardness and resistance to wear, it is an important component in the polishing slurries used during CMP. It helps achieve ultra-smooth surfaces, eliminating imperfections and enhancing the performance of microchips. It’s an essential technique in the semiconductor industry for creating high-performance chips and integrated circuits.
By utilizing zirconium in CMP polishing, we can improve the efficiency and reliability of our electronic devices. Say goodbye to slow processors and hello to lightning-fast performance!
Get in contact with us!
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DKK America Materials, Inc., 19500 Victor Parkway, Suite #290, Livonia, Michigan 48152 U.S.A.
TEL: +1(734) 540-4040