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DKK July Newsletter

Jul 1, 2023

Upcoming Events


Star Festival Observance July 7th

By Hanasakijijii, CC BY-SA 3.0, https://commons.wikimedia.org/w/index.php?curid=112885858

 

Join DKK America Materials, Inc. (“DKA”) in the Star Festival Observance on July 7th. “Tanabata (Japanese: たなばた or 七夕, meaning “Evening of the seventh”), also known as the Star Festival, is a Japanese festival. It celebrates the meeting of the deities Orihime and Hikoboshi, represented by the stars Vega and Altair respectively. According to legend, the Milky Way separates these lovers, and they are allowed to meet only once a year on the seventh day of the seventh lunar month of the lunisolar calendar. 

Learn more at: https://en.wikipedia.org/wiki/Tanabata

 

 

 

Marine Day, July 17

By Manish Prabhune – https://www.flickr.com/photos/ suzumenonamida/8203481799/, CC BY 2.0, https://commons.wikimedia.org/w/index.php?curid=112640278

Marine Day, also known as “Umi no Hi,” is a special occasion to honor and appreciate the beautiful seas surrounding Japan. It’s a day when people come together to reflect on the significance of the ocean in our lives and raise awareness about marine conservation. 

Japan, being an island nation, has a deep connection to the sea, which has shaped its culture, livelihoods, and cuisine. Marine Day allows us to recognize the vital role the ocean plays in our ecosystem and economy. 

This day encourages us to engage in various activities related to marine conservation, such as beach cleanups, educational programs, and promoting sustainable fishing practices. It reminds us of the importance of preserving the marine environment for future generations. 

Let’s take a moment today to appreciate the breathtaking beauty of our oceans, and let’s join hands in protecting and conserving them. Together, we can make a positive impact and ensure a healthier future for our precious marine ecosystems. Happy Marine Day, everyone!

 

About DKK

DKK America Materials, Inc. (“DKA”) is the wholly-owned U.S. subsidiary of Daiichi Kigenso Kagaku Kogyo Co., Ltd. (“DKK”). DKK America Materials, Inc. (“DKA”) maximizes the potential of zirconium compounds.

As a dedicated zirconium manufacturer, our unique technologies maximize the potential of zirconium properties. Our zirconium compounds and materials have many applications that advance technology and safety.

Applications Include:

  • Industrial Catalysts
  • Dental Materials
  • Automotive Catalysts
  • Electronic Materials
  • Fine Ceramics
  • Fuel Cells
  • Oxygen Sensors
  • Semiconductors

July Product Highlights

Semi-conductors

DKK America Materials, Inc. (“DKA”) produces zirconium compounds that contribute to making semiconductors.

Zirconium plays a crucial role when making semiconductors. Why is it so special? Zirconium dioxide boasts an incredible power – a high dielectric constant (k) and excellent thermal stability. Translation? It can store more charge per unit area, resulting in faster and more efficient transistors.

Furthermore, zirconium nitride (ZrN) prevents metal mayhem by stopping unwanted metal diffusion between different layers. It’s got serious adhesion skills, making sure everything sticks together. Zirconium helps make our gadgets smarter, faster, and cooler!

CMP Slurries

DKK America Materials, Inc. (“DKA”) produces zirconium compounds that contribute to making Chemical Mechanical Planarization (CMP)  slurries.

Check out these interesting tidbits about CMP slurries:

  • CMP slurries are specially designed mixtures used in the semiconductor industry to achieve super-smooth surfaces on silicon wafers. What is a silicon wafer you might ask? It’s a material used for producing semiconductors, which can be found in all types of electronic devices.
  • CMP slurries consist of abrasive particles, a chemical component, and a carrier fluid.
  • The abrasive particles in CMP slurries are typically made of materials like aluminum oxide or silica. These tiny particles help remove excess material from the wafer surface, creating a polished finish.

The chemical component in CMP slurries acts as a reactive agent, assisting in the removal of specific materials. It enhances the polishing process by chemically reacting with the surface, making it easier to achieve precise results.

CMP slurries play a crucial role in manufacturing advanced microchips and integrated circuits. They help create the intricate circuitry patterns and tiny structures that power our smartphones, computers, and other high-tech devices.

So next time you’re amazed by the incredible technology in your pocket, remember that CMP slurries played a significant part in making it all possible! 

CMP Polishing

DKA produces zirconium compounds that help make Chemical Mechanical Planarization (CMP) polishing possible.

CMP polishing is a cutting-edge technique used in the manufacturing of semiconductors, ensuring the highest quality and performance. It involves a combination of chemical and mechanical forces to achieve an ultra-smooth and flat surface on silicon wafers.

Zirconium plays a crucial role in its development. With its exceptional hardness and resistance to wear, it is an important component in the polishing slurries used during CMP. It helps achieve ultra-smooth surfaces, eliminating imperfections and enhancing the performance of microchips. It’s an essential technique in the semiconductor industry for creating high-performance chips and integrated circuits.

By utilizing zirconium in CMP polishing, we can improve the efficiency and reliability of our electronic devices. Say goodbye to slow processors and hello to lightning-fast performance!

Get in contact with us!

https://www.zr-dkk.com/dka/index.html

Follow Us: https://www.linkedin.com/company/dkk-america-materials-inc/

DKA America Materials, Inc., 19500 Victor Parkway, Suite #290, Livonia, Michigan 48152 U.S.A.

TEL: +1(734) 743-2440